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XD1008-BD - Distributed Amplifier

Download the XD1008-BD datasheet PDF. This datasheet also covers the XD1008-BD-MA variant, as both devices belong to the same distributed amplifier family and are provided as variant models within a single manufacturer datasheet.

Description

The XD1008-BD is a 30 kHz - 40 GHz GaAs MMIC distributed amplifier that has a gain of 15 dB with a 4.5 dB noise figure at 26 GHz.

This MMIC uses M/A-COM Technology Solutions’ GaAs pHEMT device model technology, and is based upon electron beam lithography to ensure high repeatability and uniformity.

Features

  • 15 dB Gain.
  • 22.5 dBm P1dB at 22 GHz.
  • 4.5 dB Noise Figure at 26 GHz.
  • Unconditional Stability over Temperature Range.
  • 100% On-Wafer RF, DC and Output Power Testing.
  • 100% Visual Inspection to MIL-STD-883 Method 2010.
  • RoHS.
  • Compliant and 260°C Reflow Compatible.

📥 Download Datasheet

Note: The manufacturer provides a single datasheet file (XD1008-BD-MA-COM.pdf) that lists specifications for multiple related part numbers.

📁 Similar Datasheet

Part Number Description Manufacturer
XD1001 GaAs MMIC Distributed Amplifier Mimix Broadband
XD1002 GaAs MMIC Distributed Amplifier Mimix Broadband
XD1002-BD Distributed Amplifier Mimix Broadband
XD1004-BD GaAs MMIC Distributed Amplifier Mimix Broadband
XD1004-QT GaAs MMIC Distributed Amplifier Mimix Broadband

Other Datasheets by MACOM Technology Solutions

Part Number Description
XD1001-BD Distributed Amplifier

Full PDF Text Transcription

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XD1008-BD Distributed Amplifier 30 kHz - 40 GHz Features  15 dB Gain  22.5 dBm P1dB at 22 GHz  4.5 dB Noise Figure at 26 GHz  Unconditional Stability over Temperature Range  100% On-Wafer RF, DC and Output Power Testing  100% Visual Inspection to MIL-STD-883 Method 2010  RoHS* Compliant and 260°C Reflow Compatible Description The XD1008-BD is a 30 kHz - 40 GHz GaAs MMIC distributed amplifier that has a gain of 15 dB with a 4.5 dB noise figure at 26 GHz. This MMIC uses M/A-COM Technology Solutions’ GaAs pHEMT device model technology, and is based upon electron beam lithography to ensure high repeatability and uniformity.
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