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RICMOS™ SOI GATE ARRAYS
FEATURES
• Fabricated on Honeywell’s Radiation Hardened – 0.65 µmLeff RICMOS™ IV SOI Process, HX2000 – 0.55 µmLeff RICMOS™ IV SOI Process, HX2000r • Array Sizes from 40K to 390K Available Gates (Raw) • HX2000 Supports 5V Core Operation • HX2000r www.DataSheet4U.com Supports 3.3V Core Operation
HX2000 HX2000r
FAMILY
• Total Dose Hardness ≥1x106 rad(SiO2) • Dose Rate Upset Hardness: ≥1x1010 rad(Si)/sec, HX2000* ≥1x109 rad(Si)/sec, HX2000r* Option Available for: ≥1x1011 rad(Si)/sec, HX2000* ≥1x1010 rad(Si)/sec, HX2000r* • Dose Rate Survivability ≥1x1012 rad(Si)/sec* • Soft Error Rate ≤1x10-11 Errors/Bit/Day, HX2000 ≤1x10-10 Errors/Bit/Day, HX2000r • Neutron Fluence Hardness to 1x1014/cm2
• HX2000r Supports Mixed Voltage I/O Buffers • TTL (5V) or CMOS (5V/3.