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HT-115 - DRY FILM PHOTORESIST

Description

and-etch applications.

Features

  • Excellent resistance to all acid plating.
  • High resolution.
  • Reliable tenting up to 0.300 inches.
  • Easily stripping and filterable.
  • Broad processing latitude in each process step.
  • Good contrast after exposure for easy inspection.

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Datasheet Details

Part number HT-115
Manufacturer ETERTEC
File Size 36.57 KB
Description DRY FILM PHOTORESIST
Datasheet download datasheet HT-115 Datasheet

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Full PDF Text Transcription

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ETERTEC® HT-115 DRY FILM PHOTORESIST DESCRIPTION ETERTEC® HT-115 dry film photoresist is an aqueous processable alkaline developable, negative acting photoresist designed for print-and-etch, plating, and tent- and-etch applications. SPECIFICATION Film Type Thickness(µm) Color(unexposed) (exposed) Recommended uses ETERTEC® 40 ± 2 Green Blue Plating Tent-and-Etch HT-115 FEATURES * Excellent resistance to all acid plating * High resolution * Reliable tenting up to 0.300 inches * Easily stripping and filterable * Broad processing latitude in each process step * Good contrast after exposure for easy inspection APPLICATIONS PRE-LAMINATION CLEANING PROCEDURE: For maximum dry film adhesion, surfaces to be coated must be clean, dry, and free of contaminates prior to lamination.
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