Datasheet4U Logo Datasheet4U.com

CTL0035NS-R3 - N-Channel MOSFET

Datasheet Summary

Description

The CTL0035NS-R3 is the N-Channel logic enhancement mode power field effect transistors are produced using high cell density, DMOS trench technology.

This high density process is especially tailored to minimize on-state resistance.

Features

  • Drain-Source Breakdown Voltage VDSS 50 V.
  • Drain-Source On-Resistance RDS(ON) 1.3Ω, at VGS= 10V, ID= 0.2A RDS(ON) 1.4Ω, at VGS= 5V, ID= 0.2A RDS(ON) 1.6Ω, at VGS= 2.75V, ID= 0.2A ℃.
  • Continuous Drain Current at TA=25 ID = 0.3A.
  • Advanced high cell density Trench Technology.
  • RoHS Compliance & Halogen Free.

📥 Download Datasheet

Datasheet preview – CTL0035NS-R3

Datasheet Details

Part number CTL0035NS-R3
Manufacturer CT Micro
File Size 736.36 KB
Description N-Channel MOSFET
Datasheet download datasheet CTL0035NS-R3 Datasheet
Additional preview pages of the CTL0035NS-R3 datasheet.
Other Datasheets by CT Micro

Full PDF Text Transcription

Click to expand full text
CTL0035NS-R3 N-Channel Enhancement MOSFET Features • Drain-Source Breakdown Voltage VDSS 50 V • Drain-Source On-Resistance RDS(ON) 1.3Ω, at VGS= 10V, ID= 0.2A RDS(ON) 1.4Ω, at VGS= 5V, ID= 0.2A RDS(ON) 1.6Ω, at VGS= 2.75V, ID= 0.2A ℃• Continuous Drain Current at TA=25 ID = 0.3A • Advanced high cell density Trench Technology • RoHS Compliance & Halogen Free Applications • DC/DC Converter • Load Switch • LCD Display inverter • Power Management Description The CTL0035NS-R3 is the N-Channel logic enhancement mode power field effect transistors are produced using high cell density, DMOS trench technology. This high density process is especially tailored to minimize on-state resistance.
Published: |