TQPHT Datasheet - TriQuint Semiconductor

TQPHT pHEMT Foundry Service

TriQuint’s 0.5 µm pHEMT process is based on our production released 0.25 µm gate process. TQPHT substitutes lower cost optical lithography in place of e-beam and adds TriQuint’s unique thick metal scheme. This process is targeted for high efficiency and linearity in power amplifiers, low noise ampli.

TQPHT Features

* Metal 2 Dielectric Metal 1 Dielectric MIM Metal Metal 2 - 4um Dielectric Metal 1 - 2um

* Metal 1 NiCr Isolation Implant Isolation Implant Nitride N+ Pseudomorphic Channel Metal 0 pHEMT MIM Capacitor Semi-Insulating GaAs Substrate NiCr Resistor

TQPHT_TriQuintSemiconductor.pdf