* Fine Lithography Trench−based Schottky Technology for Very Low Leakage
* Fast Switching with Exceptional Temperature Stability
* Low Power Loss and Lower Op.

Requiring Unique Site and Control Change Requirements; AEC−Q101 Qualified and PPAP Capable
* Wettable Flanks (WF in .

NRVTS560ETFS

NRVTS560EMFS

NRVTS560EMFST1G

NRVTS560EMFST3G

NRVTS10100EMFS

NRVTS10100EMFST1G

NRVTS10100MFS

NRVTS10100MFST1G

NRVTS10100MFST3G

NRVTS10110EMFST3G

NRVTS10120EMFS

NRVTS10120EMFST1G

NRVTS10120EMFST3G

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